Publikationen und Konferenzbeiträge
2025
Jonas Giesekus, Anton Pletzer, Florian Beckfeld, Katharina Noesges, Claudia Bock, Julian Schulze
Multi-diagnostic characterization of inductively coupled discharges
with tailored waveform substrate bias for precise control of plasma
etching
In: Plasma Sources Sci. Technol. 34 115015 2025
DOI: 10.1088/1361-6595/ae2158
Rahel-Manuela Neubieser, Luca Guido Weckelmann, Marvin Michel, Michael
Unruh, David Zanders, Aleksander Kostka, Anjana Devi, Anton Grabmaier
Gas Sensor for Ammonia and Nitrogen Oxides Made of ALD-Grown
MoS2
In: IEEE Sensors Letters, vol. 9, no. 5, pp. 1-4, May 2025
DOI: 10.1109/LSENS.2025.3555498
Florian Beckfeld, Ranna Masheyeva, Aranka Derzsi, David Alexander
Schulenberg, Ihor Korolov, Claudia Bock, Julian Schulze, Zoltán Donkó
Effective secondary electron yields for different surface
materials in capacitively coupled plasmas
In: 2025 Plasma Sources Sci. Technol. in press
DOI: 10.1088/1361-6595/adb885
2024
Malte J. M. J. Becher, Jonas B. Ullrich, Julia Jagosz, Aleksander
Kostka, Claudia Bock, Andreas Ostendorf, Evgeny L. Gurevich
Pulse Duration Dependent Formation of Laser-Induced Periodic
Surface Structures in Atomic Layer Deposited MoS2
In: Adv. Mater. Interfaces 2024, 2400478
DOI: 10.1002/admi.202400478
Julia Jagosz, Leander Willeke, Nils Gerke, Malte J. M. J. Becher, Paul
Plate, Aleksander Kostka, Detlef Rogalla,
Andreas Ostendorf, Claudia Bock
Wafer-Scale Demonstration of Polycrystalline MoS2
Growth on 200 mm Glass and SiO2/Si
Substrates by
Plasma-Enhanced Atomic Layer Deposition
In: Adv. Mater. Technol. 2024, 2400492
DOI: 10.1002/admt.202400492
Malte J. M. J. Becher, Leander Willeke, Claudia Bock, Andreas Ostendorf
Post treatment of plasma enhanced atomic layer deposited MoS2
via ultra short pulse laser to increase the crystallinity
In: Proc. SPIE 13005, Laser + Photonics for Advanced Manufacturing,
130050I, 2024
DOI: 10.1117/12.3016372
2023
Malte J. M. J. Becher, Leander Willeke, Martin Wilken, Anjana
Devi,Claudia Bock, Andreas Ostendorf
Ultrashort pulse laser phase transition of 2D MoS2
produced by
atomic layer deposition
In: LiM 2023 proceedings, Artikel-ID
182, pp. 1-8, 2023
Malte J. M. J. Becher, Julia Jagosz, Rahel-Manuela Neubieser, Jan-Lucas
Wree, Anjana Devi, Marvin Michel,
Claudia Bock, Evgeny L. Gurevich, Andreas Ostendorf
Ultrashort Pulse Laser Annealing of Amorphous Atomic Layer
Deposited MoS2
Films
In: Advanced Engineering Materials, 2023
DOI: 10.1002/adem.202300677
Malte J. Becher, Julia Jagosz, Claudia Bock, Andreas Ostendorf, Evgeny
L. Gurevich
Formation of low and high spatial frequency laser-induced
periodic surface structures (LIPSS) in ALD deposited MoS2
In: Front. Nanotechnol. Sec. Nanofabrication Volume 5 - 2023
DOI: 10.3389/fnano.2023.1227025
Julia Jagosz, Malte Becher, Leander Willeke, Claudia Bock, Andreas
Ostendorf:
Großflächiges polykristallines Wachstum von Molybdändisulfid
auf 200 mm Glaswafern für die Integration in einem
2D pH-Sensorsystem
MikroSystemTechnik Kongress 2023 (23. - 25. Oktober 2023), Dresden
Leander Willeke, Malte Becher, Nils Schmitt, Julia Jagosz, Andreas
Ostendorf, Claudia Bock:
Konzepte zur Reduktion des MoS2-Kontaktwiderstandes
basierend auf großflächig gewachsenen PEALD-Filmen
MikroSystemTechnik Kongress 2023 (23. - 25. Oktober 2023), Dresden
Florian Preischel, David Zanders, Thomas Berning, Aleksander Kostka,
Detlef Rogalla, Claudia Bock, Anjana Devi
Interplay of Precursor and Plasma for The Deposition of HfO2
via PEALD: Film Growth and Dielectric Properties
In: Adv. Mater. Interfaces 2023, 2300244
DOI: 10.1002/admi.202300244
I. Selvakumar, N. Boysen, M. Bürger, A. Devi
In pursuit of next generation N-heterocyclic
carbene-stabilized copper and silver precursors for metalorganic
chemical vapor deposition and atomic layer deposition processes
In: Chemistry 2023, 5, 2038-2055
DOI: 10.3390/chemistry5030138
M. Wilken, E. Ciftyürek, S. Cwik, L. Mai, B. Mallick, D. Rogalla, K. D.
Schierbaum, A. Devi
CVD grown tungsten oxide for low temperature hydrogen gas
sensors: Tuning surface characteristics via
materials processing for sensing applications
In: Small, 2023, 19, 2204636
DOI: 10.1002/smll.202204636
J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. Devi
Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide
Thin Films at Low Temperatures for Hydrogen
Gas Sensing
In: ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512
DOI: 10.1021/acsami.2c19827
2022
J. Jagosz, L. Willeke, M. Becher, A. Ostendorf, P. Plate, C. Bock
Large-area deposition of thin crystalline MoS2
films on 200 mm wafers using plasma-assisted atomic layer deposition
In: GMM-Fachbericht 105: Mikro-Nano-Integration, 21. – 22.11.2022,
Aachen;
VDE-Verlag, ISBN 978-3-8007-5991-0, pp. 8-11
Leander Willeke, Julia Jagosz, Nils Gerke, Paul Plate, Martin Hoffmann,
Claudia Bock
Comparative study of wafer-scale Al2O3
layers made by thermal and plasma-enhanced ALD
In: GMM-Fachbericht 105: Mikro-Nano-Integration, 21. – 22.11.2022,
Aachen;
VDE-Verlag, ISBN 978-3-8007-5991-0, pp. 100-104
Thomas Berning, Malte Becher, Jan-Lucas Wree, Julia Jagosz, Aleksander
Kostka, Andreas Ostendorf, Anjana Devi,
Claudia Bock
Nucleation and growth studies of large-area deposited WS2
on flexible substrates
In: Mater. Res. Express 9 116401 (2022)
DOI: 10.1088/2053-1591/ac9bd0
N. Huster, R. Ghiyasi, D. Zanders, D. Rogalla, M. Karppinen, A. Devi
SnO Deposition via Water Based ALD employing Tin(ii)
Formamidinate: Precursor Characterization and
Process Development
In: Dalton Transactions, 2022, 51, 14970-14979
DOI: 10.1039/d2dt02562k
R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A.
Devi, C. Bock, M. Michel, A. Grabmaier
Low-Temperature ALD Process Development of 200 mm wafer-scale
MoS2
for Gas Sensing Application
In: Micro and Nano Engineering, Vol. 15, 100126 (2022)
DOI: 10.1016/j.mne.2022.100126
2021
M. Becher, J.-L. Wree, T. Berning, R.-M. Neubieser, A. Ostendorf, A.
Devi, C. Bock, M. Michel
Raman spectroscopy as an effective tool for characterizing
large-area 2D TMDs deposited from the gas phase
In: MikroSystemTechnik Kongress 2021 (8. – 10. November 2021),
Stuttgart-Ludwigsburg;
VDE-Verlag, ISBN 978-3-8007-5656-8
T. Berning, S. M. J. Beer, N. Boysen, A. Devi, C. Bock
Electrical properties of functional Y2O3 films applied to thin
film transistors
In: MikroSystemTechnik Kongress 2021 (8. – 10. November 2021),
Stuttgart-Ludwigsburg;
VDE-Verlag, ISBN 978-3-8007-5656-8
M. Hoffmann, P. Awakowicz, A. Devi, J. Schulze, B. Freyer, F.P. Witek,
C. Bock
Ein Prozess-Integrierendes Clustertool für 2D-Materialsysteme:
vom Einzelprozess zur Integration auf Waferlevel
A process-integrating cluster tool for 2D materials: from single
process to wafer level integration
In: MikroSystemTechnik Kongress 2021 (8. – 10. November 2021),
Stuttgart-Ludwigsburg;
VDE-Verlag, ISBN 978-3-8007-5656-8
D. Zanders, J. Liu, J. Obenlüneschloß, C. Bock, D. Rogalla, L. Mai, M.
Nolan, S. T. Barry, A.Devi
Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc
Alkyl Precursors as Reductants for
Low Resistivity Co Thin Films
In: Chem. Mater., 2021, 33, 13, 5045-5057
DOI: 10.1021/acs.chemmater.1c00877
Nils Boysen, David Zanders, Thomas Berning, Sebastian M. J. Beer,
Detlef Rogalla, Claudia Bock and Anjana Devi
Atomic layer deposition of dielectric Y2O3
thin films from a homoleptic yttrium formamidinate precursor and water
In: RSC Advances, 2021, 11, 2565-2574
DOI: 10.1039/D0RA09876K
Jan-Lucas Wree, Jean-Pierre Glauber, Denis Öhl, Alessia Niesen,
Aleksander Kostka, Detlef Rogalla,
Wolfgang Schuhmann and Anjana Devi
Sensing and electrocatalytic activity of tungsten disulphide
thin films fabricated via metal–organic chemical
vapour deposition
In: J. Mater. Chem. C, 2021, 9, 10254-10265
DOI: 10.1039/D1TC02417E
S. M. J. Beer, N. Boysen, A. Muriqi, D. Zanders, T. Berning, D.
Rogalla, C. Bock, M. Nolan, A. Devi
A study on the influence of ligand variation on formamidinate
complexes of yttrium: New precursors for
atomic layer deposition of yttrium oxide
In: Dalton Transactions, 2021, 50, 12944-12956
DOI: 10.1039/d1dt01634b
Stefan Ries, Manuel Schroeder, Marc Woestefeld, Carles Corbella, Ihor
Korolov, Peter Awakowicz and Julian Schulze
Relative calibration of a retarding field energy analyzer
sensor array for spatially resolved measurements of the
ion flux and ion energy in low temperature plasmas
In: Review of Scientific Instruments 92, 103503 (2021)
DOI: 10.1063/5.0059658
2020
Jan-Lucas Wree, Engin Ciftyürek, David Zanders, Nils Boysen, Aleksander
Kostka, Detlef Rogalla, Maren Kasischke
Andreas Ostendorf, Klaus Schierbaum and Anjana Devi
A new metalorganic chemical vapor deposition process for MoS2
with a 1,4-diazabutadienyl stabilized
molybdenum precursor and elemental sulfur
In: Dalton Transactions, 2020, 49, 13462-13474
DOI: 10.1039/D0DT02471F
R.-M. Neubieser, A. M. Knauss, M. Michel, S. Weyers, J. -L. Wree and A.
Devi
Concept for two-dimensional TMDs as Functional Layer for Gas
Sensing Applications
Mikro-Nano-Integration; 8th GMM-Workshop, Online, 2020, pp. 1-5.
Th. Berning, J.-L. Wree, A. Devi, C. Bock
Strukturierung von großflächig abgeschiedenen
Übergangsmetall-Dichalkogenid Filmen für den Einsatz
in der 2D-Elektronik
Mikro-Nano-Integration; 8th GMM-Workshop, Online, 2020, pp. 1-5.