Publikationen und Konferenzbeiträge

2023

Malte J. M. J. Becher, Julia Jagosz, Rahel-Manuela Neubieser, Jan-Lucas Wree, Anjana Devi, Marvin Michel,
Claudia Bock, Evgeny L. Gurevich, Andreas Ostendorf
Ultrashort Pulse Laser Annealing of Amorphous Atomic Layer Deposited MoS₂ Films
In: Advanced Engineering Materials, 2023
DOI: 10.1002/adem.202300677

Florian Preischel, David Zanders, Thomas Berning, Aleksander Kostka, Detlef Rogalla, Claudia Bock, Anjana Devi
Interplay of Precursor and Plasma for The Deposition of HfO₂ via PEALD: Film Growth and Dielectric Properties
In: Adv. Mater. Interfaces 2023, 2300244
DOI: 10.1002/admi.202300244

Malte J. Becher, Julia Jagosz, Claudia Bock, Andreas Ostendorf, Evgeny L. Gurevich
Formation of low and high spatial frequency laser-induced periodic surface structures (LIPSS) in ALD deposited MoS₂
In: Front. Nanotechnol. Sec. Nanofabrication Volume 5 - 2023
DOI: 10.3389/fnano.2023.1227025

J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. Devi
Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen
Gas Sensing
In: ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512
DOI: 10.1021/acsami.2c19827

2022

J. Jagosz, L. Willeke, M. Becher, A. Ostendorf, P. Plate, C. Bock
Large-area deposition of thin crystalline MoS₂ films on 200 mm wafers using plasma-assisted atomic layer deposition
In: GMM-Fachbericht 105: Mikro-Nano-Integration, 21. – 22.11.2022, Aachen;
VDE-Verlag, ISBN 978-3-8007-5991-0, pp. 8-11

Leander Willeke, Julia Jagosz, Nils Gerke, Paul Plate, Martin Hoffmann, Claudia Bock
Comparative study of wafer-scale Al₂O₃ layers made by thermal and plasma-enhanced ALD
In: GMM-Fachbericht 105: Mikro-Nano-Integration, 21. – 22.11.2022, Aachen;
VDE-Verlag, ISBN 978-3-8007-5991-0, pp. 100-104

Thomas Berning, Malte Becher, Jan-Lucas Wree, Julia Jagosz, Aleksander Kostka, Andreas Ostendorf, Anjana Devi,
Claudia Bock
Nucleation and growth studies of large-area deposited WS₂ on flexible substrates
In: Mater. Res. Express 9 116401 (2022)
DOI: 10.1088/2053-1591/ac9bd0

M. Wilken, E. Ciftyürek, S. Cwik, L. Mai, B. Mallick, D. Rogalla, K. D. Schierbaum, A. Devi
CVD grown tungsten oxide for low temperature hydrogen gas sensors: Tuning surface characteristics via
materials processing for sensing applications
In: Small, 2022, 2204636
DOI: 10.1002/smll.202204636

N. Huster, R. Ghiyasi, D. Zanders, D. Rogalla, M. Karppinen, A. Devi
SnO Deposition via Water Based ALD employing Tin(ii) Formamidinate: Precursor Characterization and
Process Development
In: Dalton Transactions, 2022, 51, 14970-14979
DOI: 10.1039/d2dt02562k

R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A. Devi, C. Bock, M. Michel, A. Grabmaier
Low-Temperature ALD Process Development of 200 mm wafer-scale MoS₂ for Gas Sensing Application
In: Micro and Nano Engineering, Vol. 15, 100126 (2022)
DOI: 10.1016/j.mne.2022.100126

2021

M. Becher, J.-L. Wree, T. Berning, R.-M. Neubieser, A. Ostendorf, A. Devi, C. Bock, M. Michel
Raman spectroscopy as an effective tool for characterizing large-area 2D TMDs deposited from the gas phase
In: MikroSystemTechnik Kongress 2021 (8. – 10. November 2021), Stuttgart-Ludwigsburg;
VDE-Verlag, ISBN 978-3-8007-5656-8

T. Berning, S. M. J. Beer, N. Boysen, A. Devi, C. Bock
Electrical properties of functional Y2O3 films applied to thin film transistors
In: MikroSystemTechnik Kongress 2021 (8. – 10. November 2021), Stuttgart-Ludwigsburg;
VDE-Verlag, ISBN 978-3-8007-5656-8

M. Hoffmann, P. Awakowicz, A. Devi, J. Schulze, B. Freyer, F.P. Witek, C. Bock
Ein Prozess-Integrierendes Clustertool für 2D-Materialsysteme: vom Einzelprozess zur Integration auf Waferlevel
A process-integrating cluster tool for 2D materials: from single process to wafer level integration
In: MikroSystemTechnik Kongress 2021 (8. – 10. November 2021), Stuttgart-Ludwigsburg;
VDE-Verlag, ISBN 978-3-8007-5656-8

D. Zanders, J. Liu, J. Obenlüneschloß, C. Bock, D. Rogalla, L. Mai, M. Nolan, S. T. Barry, A.Devi
Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for
Low Resistivity Co Thin Films
In: Chem. Mater., 2021, 33, 13, 5045-5057
DOI: 10.1021/acs.chemmater.1c00877

Nils Boysen, David Zanders, Thomas Berning, Sebastian M. J. Beer, Detlef Rogalla, Claudia Bock and Anjana Devi
Atomic layer deposition of dielectric Y₂O₃ thin films from a homoleptic yttrium formamidinate precursor and water
In: RSC Advances, 2021, 11, 2565-2574
DOI: 10.1039/D0RA09876K

Jan-Lucas Wree, Jean-Pierre Glauber, Denis Öhl, Alessia Niesen, Aleksander Kostka, Detlef Rogalla,
Wolfgang Schuhmann and Anjana Devi
Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metal–organic chemical
vapour deposition
In: J. Mater. Chem. C, 2021, 9, 10254-10265
DOI: 10.1039/D1TC02417E

S. M. J. Beer, N. Boysen, A. Muriqi, D. Zanders, T. Berning, D. Rogalla, C. Bock, M. Nolan, A. Devi
A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for
atomic layer deposition of yttrium oxide
In: Dalton Transactions, 2021, 50, 12944-12956
DOI: 10.1039/d1dt01634b

Stefan Ries, Manuel Schroeder, Marc Woestefeld, Carles Corbella, Ihor Korolov, Peter Awakowicz and Julian Schulze
Relative calibration of a retarding field energy analyzer sensor array for spatially resolved measurements of the
ion flux and ion energy in low temperature plasmas
In: Review of Scientific Instruments 92, 103503 (2021)
DOI: 10.1063/5.0059658


2020

Jan-Lucas Wree, Engin Ciftyürek, David Zanders, Nils Boysen, Aleksander Kostka, Detlef Rogalla, Maren Kasischke
Andreas Ostendorf, Klaus Schierbaum and Anjana Devi
A new metalorganic chemical vapor deposition process for MoS₂ with a 1,4-diazabutadienyl stabilized
molybdenum precursor and elemental sulfur
In: Dalton Transactions, 2020, 49, 13462-13474
DOI: 10.1039/D0DT02471F

R.-M. Neubieser, A. M. Knauss, M. Michel, S. Weyers, J. -L. Wree and A. Devi
Concept for two-dimensional TMDs as Functional Layer for Gas Sensing Applications
Mikro-Nano-Integration; 8th GMM-Workshop, Online, 2020, pp. 1-5.

Th. Berning, J.-L. Wree, A. Devi, C. Bock
Strukturierung von großflächig abgeschiedenen Übergangsmetall-Dichalkogenid Filmen für den Einsatz
in der 2D-Elektronik
Mikro-Nano-Integration; 8th GMM-Workshop, Online, 2020, pp. 1-5.